Customized R&D

Post-lithography Stripper, Cleaning Solution

Benchmark Products: EKC260
Product Introduction Page: Remove and clean residual photoresist after the lithography process
Specifications
Detailed Introduction
Stripper: Used to remove residual photoresist after the lithography process to prepare for subsequent process steps; features strong stripping capability and good compatibility with substrate materials. Cleaning Solution: Used to clean the substrate after lithography to ensure product quality and performance; features good cleaning effect and easy rinsing."
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