Electronic grade hydrofluoric acid is one of the key chemicals in semiconductor manufacturing. Due to its high purity and strong corrosiveness, it is used in wafer cleaning processes to remove oxide layers and, in combination with other acids, to remove contaminants such as metal ions; in etching processes, it is used for high-precision etching of silicon dioxide insulation or isolation layers; and in post-ion implantation processing to remove doped glass layers and other semiconductor processes. This product features ultra-high purity, low particulate matter, and high precision in concentration control, and can meet various customer packaging requirements.