High-purity hydrogen chloride plays a key role in processes such as surface cleaning of silicon wafers, high-temperature gas-phase etching, etching of third-generation compound semiconductors, doping and etching in chemical vapor deposition, equipment cleaning of silicon-based deposits in CVD or etch reaction chambers, and stripping of photoresist residue in the semiconductor industry. This product features advantages such as ultra-high purity and can meet various customer requirements for packaging and cylinder connections.