High-purity chlorine is a key gas in semiconductor processes, featuring strong oxidizing properties and high reactivity. It is mainly used for dry etching of silicon and polysilicon, metal etching, and compound semiconductor etching; thin film deposition such as silicon epitaxy and silicon nitride deposition; and chamber cleaning of silicon/metal deposits in CVD or etching chambers. This product features advantages such as ultra-high purity and can meet various customer requirements for packaging and cylinder connections.