As a new-generation fluorine-containing electronic gas, high-purity monofluoromethane plays a key role in semiconductor manufacturing due to its special physicochemical properties in high-selectivity dielectric etching, self-aligned contact holes in logic chips, atomic layer precision etching, and advanced packaging (TSV insulation layer etching and RDL redistribution layer), gradually replacing traditional high-GWP gases. This product features advantages such as ultra-high purity and can meet various customer requirements for packaging and cylinder connections.