High-purity ethyl silicate (TEOS) is widely used in the chemical vapor deposition process in semiconductor manufacturing to form a silica deposition film, produce a conductive layer or insulating layer, produce an anti-reflective film to improve light absorption, and temporarily block etching, so as to prevent pollutants and impurities from entering semiconductor components. This product has the advantages of ultra-high purity, which can meet the requirements of customers for a variety of packaging and cylinder joints.